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Method for chemical analysis of the high-purity arsenic—Inductive coupling plasma mass spectrum (ICP-MS) for determinating the concentration of elements in the high-purity arsenic
Standard in brief
Scope of Application：
YS/T 34的本部分规定了高纯砷中金属杂质含量的测定方法，采用电感耦合等离子质谱法测定砷中镁、铬、镍、铜、锌、银、锑、铅、铋、钠、钾、铝、钙、铁等14个杂质含量。
本部分适用于99.999%～99.999 99%高纯砷中金属杂质含量的测定。测定范围为1×10－7%～1 000×10－7%。
Basic information
Standard No：YS/T 34.1-2011
Standard Name：高纯砷化学分析方法 电感耦合等离子体质谱法(ICP-MS)测定 高纯砷中杂质含量
English Name：Method for chemical analysis of the high-purity arsenic—Inductive coupling plasma mass spectrum (ICP-MS) for determinating the concentration of elements in the high-purity arsenic
Standard Status：现行
Release Date：1992-01-01
Effective Date：2012-07-01
Language of Publication：中文简体
Standard Classification
ICS Number：77.040.30
CCS Number：H17
Publication Information
Number of pages：12
Number of words：11 K
Format：大16
Edition：1
Color Pages：0
Electronic Version：Yes
Color Images：No
Print Publication Date：2012-06-01
Standard Revision Information
Has Amendment：No
Other Information
Application Dept：中华人民共和国工业和信息化部
Standard Type：QT
Standard Attribute：YS
Other Standard Number：34.1
Drafter：程高明、邹同贵、文英、唐云博、廖敏
Drafting Organization：峨嵋半导体材料厂、峨眉山嘉美高纯材料有限公司
Management Organization：全国有色金属标准化技术委员会
