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Chemical analysis methods of gallium for industrial use—Determination of impurity elements—Inductively coupled plasma atomic emission spectrometric method
Standard in brief
Scope of Application：
本标准规定了工业镓中硅、钠、钾、镁、钙、铝含量的测定方法。
本标准适用于工业镓[99.9％≤ω(%)≤99.995％]中硅、钠、钾、镁、钙、铝含量的测定。测定范围见表1。
Basic information
Standard No：YS/T 666-2008
Standard Name：工业镓化学分析方法 杂质元素的测定 电感耦合等离子体原子发射光谱法
English Name：Chemical analysis methods of gallium for industrial use—Determination of impurity elements—Inductively coupled plasma atomic emission spectrometric method
Standard Status：现行
Release Date：2008-03-12
Effective Date：2008-09-01
Language of Publication：中文简体
Standard Classification
ICS Number：77.120.99
CCS Number：H12
Related Standards
Referenced Standards： GB/T 602-2002
Publication Information
Number of pages：8
Number of words：8 K
Format：大16
Edition：1
Color Pages：0
Electronic Version：Yes
Color Images：No
Print Publication Date：2008-05-01
Standard Revision Information
Has Amendment：No
Other Information
Application Dept：国家发展和改革委员会
Standard Type：QT
Standard Attribute：YS
Drafter：梁倩、王书勤、王晓雯、张予秋、张新宇
Drafting Organization：中国铝业股份有限公司河南分公司、中国有色金属工业标准计量质量研究所
Management Organization：全国有色金属标准化技术委员会
Proposing Department：全国有色金属标准化技术委员会
