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Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications
Standard in brief
Scope of Application：
本标准规定了电子薄膜制备用高纯金属溅射靶材的纯度等级的定义方法、杂质含量分析方法、抽样规则及靶材纯度等级报告标准规范等内容。
本标准适用于电子薄膜用各类高纯金属溅射靶材(以下简称靶材)。其他对纯度有较高要求的靶材纯度等级、杂质含量分析及报告规范也可参照使用。
Basic information
Standard No：YS/T 935-2013
Standard Name：电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南
English Name：Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications
Standard Status：现行
Release Date：2013-10-17
Effective Date：2014-03-01
Language of Publication：中文简体
Standard Classification
ICS Number：77.150.99
CCS Number：H68
Related Standards
Referenced Standards：GB/T 14265,GB/T 20975(所有部分),GB/T 29658,YS/T 871,YS/T 922
Publication Information
Number of pages：8
Number of words：6 K
Format：大16
Edition：1
Color Pages：0
Electronic Version：Yes
Color Images：No
Print Publication Date：2014-03-01
Standard Revision Information
Has Amendment：No
Other Information
Application Dept：中华人民共和国工业和信息化部
Standard Type：QT
Standard Attribute：YS
Other Standard Number：935
Drafter：张涛、何金江、丁照崇、万小勇、徐建卫、廖赞、尚再艳、王欣平、熊晓东、吕保国
Drafting Organization：有研亿金新材料股份有限公司
Management Organization：全国有色金属标准化技术委员会(SAC/TC 243)
