Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques
MOD SEMI MF847-0705
全国半导体设备和材料标准化技术委员会材料分技术委员会
2.1 本标准规定了α角的测量方法，α角为垂直于圆型硅片基准参考平面的晶向与硅片表面参考面间角。
2.2 本标准适用于硅片的参考面长度范围应符合GB/T 12964和GB/T 12965中的规定，且硅片角度偏离应在-5°到+5°范围之内。
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