Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
IDT ISO 14237:2000
全国微束标准化技术委员会
本标准详细说明了用标定的均匀掺杂物质（用注入硼的参考物质校准）确定单晶硅中硼的原子浓度的二次离子质谱方法。它适用于均匀掺杂硼浓度范围从1×10 16 atoms/cm 3~1×10 20 atoms/cm3。
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