Trichlorosilane for silicon epitaxy—Determination of boron,aluminium,phosphorus,vanadium,chrome,manganese,iron,cobalt,nickel,copper,arsenic,molybdenum and antimony content—Inductively coupled plasma mass spectrometric method
全国半导体设备和材料标准化技术委员会(SAC/TC 203)
本标准规定了用电感耦合等离子体质谱仪（ICP-MS）测定硅外延用三氯氢硅（SiHCl3）中硼、铝、磷、钒、铬、锰、铁、钴、镍、铜、钼、砷、锑等痕量元素含量的方法。
本标准适用于硅外延用三氯氢硅（SiHCl3）中硼、铝、磷、钒、铬、锰、铁、钴、镍、铜、钼、砷、锑等含量的测定。各元素测定范围见表1。
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