Equipment for preparation of nitride semiconductor materials by hydride vapor phase epitaxy
全国半导体设备和材料标准化技术委员会(SAC/TC 203)
本标准规定了制备氮化物半导体材料用氢化物气相外延设备(以下简称“HVPE设备”）的产品分类和标记、工作条件、要求、检测方法、检验规则、标志、包装、运输和储存。
本标准适用于制备直径50.8 mm~152.4 mm氮化物半导体材料的HVPE设备。
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