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High-purity sputtering titanium target used in electronic film
Standard in brief
Scope of Application：
本标准规定了电子薄膜用高纯钛溅射靶材的要求、试验方法、检验规则和标志、包装、运输、贮存及质量证明与合同(订单)等内容。
本标准适用于电子薄膜制造用的各类钛溅射靶材。
Basic information
Standard No：YS/T 893-2013
Standard Name：电子薄膜用高纯钛溅射靶材
English Name：High-purity sputtering titanium target used in electronic film
Standard Status：现行
Release Date：2013-10-17
Effective Date：2014-03-01
Language of Publication：中文简体
Standard Classification
ICS Number：77.150.50
CCS Number：H64
Related Standards
Referenced Standards：GB/T 1031,GB/T 4698.7,GB/T 4698.14,GB/T 4698.15,GB/T 6394,GJB 1580A,YS/T 837,YS/T 891,YS/T 892
Publication Information
Number of pages：12
Number of words：14 K
Format：大16
Edition：1
Color Pages：0
Electronic Version：Yes
Color Images：No
Print Publication Date：2014-03-01
Standard Revision Information
Has Amendment：No
Other Information
Application Dept：中华人民共和国工业和信息化部
Standard Type：QT
Standard Attribute：YS
Other Standard Number：893
Drafter：何金江、董亭义、袁海军、罗俊锋、滕海涛、喻洁、贺昕、钱红兵、周辰、刘丹、陆灵芝、王学泽、熊晓东
Drafting Organization：有研亿金新材料股份有限公司、宁波江丰电子材料有限公司
Management Organization：全国有色金属标准化技术委员(SAC/TC 243)
