Chinese Standard: GB/T 34649-2017

Magnetron sputtering ruthenium target.

全国有色金属标准化技术委员会(SAC/TC 243)

本标准规定了磁控溅射用钌靶的要求、试验方法、检验规则及标志、包装、运输、贮存、质量证明书和订货单（或合同）内容。本标准适用于微电子领域镀膜用磁控溅射钌靶（以下简称钌靶）。

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